This article focuses on the polycrystalline silicon panel, amorphous silicon panel and microcrystalline silicon thin film silicon solar cells and other characteristics, preparation methods, application and development status. And in accordance with the current international situation and the needs of society, proposed the development of solar cell materials and applications.
Currently, the world’s energy consumption increased dramatically and the status of natural resources constraints of the international community has increasingly become the bottleneck of economic development, so there is an urgent need to find renewable clean energy to meet the new needs of the community. Solar energy as the Earth’s pollution-free renewable energy attracted widespread attention of scientific researchers, research and application of solar cells has been developing rapidly. The world’s largest solar cell manufacturer chairman of Japan’s Sharp Electric Company said Mikio Katayama [1]: “2013 is a silicon and crystalline silicon thin film go hand in hand, since 2013, will become the mainstream silicon thin film.” Visible, thin film solar cell technology development has been beyond the traditional solar cells, solar cells become the focus of R & D direction and the mainstream. Successful products have been developed mainly polycrystalline silicon thin film solar cells, amorphous silicon thin film solar cells and microcrystalline silicon thin film solar cells. Be described separately below.
A polycrystalline silicon thin film solar cells
Polycrystalline silicon thin film solar cells [2] is based on monocrystalline silicon solar cells developed. Monocrystalline silicon solar cells are crystalline silicon cells, the conversion efficiency is the highest, most mature solar cell technology, especially in industrial production and large-scale applications, single crystal silicon solar cells dominate. But the expensive silicon material, preparation process very complicated, so the researchers started from the 70’s to low-cost polycrystalline silicon films deposited on the substrate, hoping to reduce costs, but the experimental conditions, level of technology was limited, resulting in the growth of crystalline silicon films grain is too small, not able to achieve results. With the development of technology, polycrystalline silicon thin film solar cell preparation and application of all the great progress. Currently, the preparation of polycrystalline silicon thin film solar cell and more by various chemical vapor deposition, including low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) process and rapid thermal chemical vapor deposition (RTCVD) process. Besides epitaxial growth of semiconductor liquid, solid-phase crystallization and sputtering deposition method is also used to prepare polycrystalline silicon thin film solar cells.
Polycrystalline silicon thin film solar cell conversion efficiency is also greatly improved, and some are close to single crystal silicon solar cells. Mitsubishi companies such as Japan prepared on silica substrate polysilicon thin-film solar cells, the optical efficiency of up to 16.5%. German solar researchers used technology zone melting recrystallization of polysilicon prepared by battery, the conversion efficiency of up to 19% [3]. Polycrystalline silicon thin-film batteries are used less than silicon, inefficient recession, and may low-cost substrate materials in the preparation, cost far less than a high efficiency monocrystalline silicon cells and, therefore polycrystalline silicon thin film solar cells have been development of thin film silicon solar cells become one of the hot, with good prospects for development.
2 amorphous silicon thin film solar cells
Amorphous silicon, also known as amorphous silicon (referred to as a-Si), is a silicon allotrope. Amorphous silicon thin film solar cell of its low cost, ease of mass production and widespread attention has been paid and developed, is the most recognized environmental performance of solar cells. Amorphous silicon thin film solar cell preparation methods [4] reactive sputtering, low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) and so on. PECVD method in which the most mature, to be prepared at low temperature amorphous silicon solar cells.
Amorphous silicon thin film solar cells with energy saving, high performance, energy recovery cycle is short and so on, but the amorphous silicon thin film [5] of the optical band gap (1.7eV) and the solar spectrum does not match, limiting the conversion efficiency of the battery , and its optical efficiency will increase with the illumination time decay. Therefore, the amorphous silicon thin film solar cell research focused on improving efficiency and stability, the specific programs [6] are: band gap by different multi-junction stacked to improve efficiency and stability; reduce light reflection and improve the surface of the battery structure; with thinner i-layer; to enhance the internal electric field, reducing light-induced decay. 4 aspects of the work on the above research and development, I believe that in the near future, the amorphous silicon thin film solar cells will have greatly improved the performance to better serve humanity.
3 microcrystalline silicon thin film solar cells
In order to develop a high conversion efficiency and performance of solar cells is more stable in recent years have become a microcrystalline silicon solar cell research is another hot spot. Microcrystalline silicon as a narrow band gap materials and amorphous silicon thin-film battery composed of laminated structure, can take advantage of the solar spectrum, and can solve the stability of amorphous silicon thin film battery problems.
Currently, the preparation of microcrystalline silicon technology methods include three kinds of major chemical vapor deposition method [7]. The earliest deposition of microcrystalline silicon technology for the RF plasma enhanced chemical vapor deposition (RF-PECVD), but the properties of materials prepared by poor people through improved later to improve the deposition pressure, increasing the discharge power, so that film quality and deposition rate have been greatly improved. The second method is even high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD), is to increase the plasma excitation frequency, which can effectively achieve high-quality microcrystalline silicon, high-speed growth. But the existence of standing wave effect and the loss of technology wave effect, it is difficult to achieve large-scale industrialized production. There is also a new thin film deposition method – hot filament chemical vapor deposition (HW-CVD), but this method was low cost and easy to cause environmental pollution, material defect density is high, so to some extent limit the microcrystalline silicon Materials in solar cell application and development.
4 Conclusion
Solar cells is to ease the energy crisis of the new photovoltaic devices. Since the 90s of the 20th century, the global solar cell industry, an increase of 15% a year continued to develop [8], China has overtaken Europe and Japan as the world superpower of solar cell production, battery performance has greatly improved applications become increasingly widespread. At present, developed a new type of silicon-based thin film solar cells with high efficiency and partial implementation of the commercialization, but there are still many defects, thereby improving the performance of solar cells, lower manufacturing costs and reducing production of large-scale environmental impact of the future the main direction of development of solar cells.
Thin Film Silicon Solar Cells Introduce
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This article focuses on the polycrystalline silicon panel, amorphous silicon panel and microcrystalline silicon thin film silicon solar cells and other characteristics, preparation methods, application and development status. And in accordance with the current international situation and the needs of society, proposed the development of solar cell materials and applications.
Currently, the world’s energy consumption increased dramatically and the status of natural resources constraints of the international community has increasingly become the bottleneck of economic development, so there is an urgent need to find renewable clean energy to meet the new needs of the community. Solar energy as the Earth’s pollution-free renewable energy attracted widespread attention of scientific researchers, research and application of solar cells has been developing rapidly. The world’s largest solar cell manufacturer chairman of Japan’s Sharp Electric Company said Mikio Katayama [1]: “2013 is a silicon and crystalline silicon thin film go hand in hand, since 2013, will become the mainstream silicon thin film.” Visible, thin film solar cell technology development has been beyond the traditional solar cells, solar cells become the focus of R & D direction and the mainstream. Successful products have been developed mainly polycrystalline silicon thin film solar cells, amorphous silicon thin film solar cells and microcrystalline silicon thin film solar cells. Be described separately below.
A polycrystalline silicon thin film solar cells
Polycrystalline silicon thin film solar cells [2] is based on monocrystalline silicon solar cells developed. Monocrystalline silicon solar cells are crystalline silicon cells, the conversion efficiency is the highest, most mature solar cell technology, especially in industrial production and large-scale applications, single crystal silicon solar cells dominate. But the expensive silicon material, preparation process very complicated, so the researchers started from the 70’s to low-cost polycrystalline silicon films deposited on the substrate, hoping to reduce costs, but the experimental conditions, level of technology was limited, resulting in the growth of crystalline silicon films grain is too small, not able to achieve results. With the development of technology, polycrystalline silicon thin film solar cell preparation and application of all the great progress. Currently, the preparation of polycrystalline silicon thin film solar cell and more by various chemical vapor deposition, including low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) process and rapid thermal chemical vapor deposition (RTCVD) process. Besides epitaxial growth of semiconductor liquid, solid-phase crystallization and sputtering deposition method is also used to prepare polycrystalline silicon thin film solar cells.
Polycrystalline silicon thin film solar cell conversion efficiency is also greatly improved, and some are close to single crystal silicon solar cells. Mitsubishi companies such as Japan prepared on silica substrate polysilicon thin-film solar cells, the optical efficiency of up to 16.5%. German solar researchers used technology zone melting recrystallization of polysilicon prepared by battery, the conversion efficiency of up to 19% [3]. Polycrystalline silicon thin-film batteries are used less than silicon, inefficient recession, and may low-cost substrate materials in the preparation, cost far less than a high efficiency monocrystalline silicon cells and, therefore polycrystalline silicon thin film solar cells have been development of thin film silicon solar cells become one of the hot, with good prospects for development.
2 amorphous silicon thin film solar cells
Amorphous silicon, also known as amorphous silicon (referred to as a-Si), is a silicon allotrope. Amorphous silicon thin film solar cell of its low cost, ease of mass production and widespread attention has been paid and developed, is the most recognized environmental performance of solar cells. Amorphous silicon thin film solar cell preparation methods [4] reactive sputtering, low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) and so on. PECVD method in which the most mature, to be prepared at low temperature amorphous silicon solar cells.
Amorphous silicon thin film solar cells with energy saving, high performance, energy recovery cycle is short and so on, but the amorphous silicon thin film [5] of the optical band gap (1.7eV) and the solar spectrum does not match, limiting the conversion efficiency of the battery , and its optical efficiency will increase with the illumination time decay. Therefore, the amorphous silicon thin film solar cell research focused on improving efficiency and stability, the specific programs [6] are: band gap by different multi-junction stacked to improve efficiency and stability; reduce light reflection and improve the surface of the battery structure; with thinner i-layer; to enhance the internal electric field, reducing light-induced decay. 4 aspects of the work on the above research and development, I believe that in the near future, the amorphous silicon thin film solar cells will have greatly improved the performance to better serve humanity.
3 microcrystalline silicon thin film solar cells
In order to develop a high conversion efficiency and performance of solar cells is more stable in recent years have become a microcrystalline silicon solar cell research is another hot spot. Microcrystalline silicon as a narrow band gap materials and amorphous silicon thin-film battery composed of laminated structure, can take advantage of the solar spectrum, and can solve the stability of amorphous silicon thin film battery problems.
Currently, the preparation of microcrystalline silicon technology methods include three kinds of major chemical vapor deposition method [7]. The earliest deposition of microcrystalline silicon technology for the RF plasma enhanced chemical vapor deposition (RF-PECVD), but the properties of materials prepared by poor people through improved later to improve the deposition pressure, increasing the discharge power, so that film quality and deposition rate have been greatly improved. The second method is even high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD), is to increase the plasma excitation frequency, which can effectively achieve high-quality microcrystalline silicon, high-speed growth. But the existence of standing wave effect and the loss of technology wave effect, it is difficult to achieve large-scale industrialized production. There is also a new thin film deposition method – hot filament chemical vapor deposition (HW-CVD), but this method was low cost and easy to cause environmental pollution, material defect density is high, so to some extent limit the microcrystalline silicon Materials in solar cell application and development.
4 Conclusion
Solar cells is to ease the energy crisis of the new photovoltaic devices. Since the 90s of the 20th century, the global solar cell industry, an increase of 15% a year continued to develop [8], China has overtaken Europe and Japan as the world superpower of solar cell production, battery performance has greatly improved applications become increasingly widespread. At present, developed a new type of silicon-based thin film solar cells with high efficiency and partial implementation of the commercialization, but there are still many defects, thereby improving the performance of solar cells, lower manufacturing costs and reducing production of large-scale environmental impact of the future the main direction of development of solar cells.